RICHARDSON, Texas, March 11 -- Optical Switch Corp. (OSC) said it has installed its Model PC2 high-resolution lithography system at JDS Uniphase, Eindhoven, the Netherlands. The interference lithography-based Model PC2, developed by OSC's Microphotonics Group in Bedford, Mass., generates 190 nm- to 260 nm-period grating structures with a fully automated, high-throughput patterning tool and process. "OSC has clearly demonstrated a high caliber of expertise in this area, as well as providing an unsurpassed level of commitment to this project," said Arthur Weesie, JDS Uniphase senior purchasing manager.
"The Model PC2 enables the generation of grating structures required in a high-throughput, stabile production process," said Jim Nole, marketing manager for OSC's Microphotonics Group.