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Hamamatsu Corp. - Earth Innovations LB 2/24

TRW, Sandia Report Gains in High-Energy EUV Lithography

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ST. CHARLES, Mo., March 14 -- Cutting Edge Optronics Inc., a division of TRW, and Sandia National Laboratories, a member of the Virtual National Laboratory, said they have successfully demonstrated the first lithography using a high-power laser-produced plasma extreme ultraviolet light source. The demonstration employed a TRW-designed laser-based light source on a system called the engineering test stand (ETS) developed by Sandia, Lawrence Berkeley and Lawrence Livermore National Laboratories. Extreme ultraviolet (EUV) light at 13.4 nm is an emerging photolithography technology for the...Read full article

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    Published: March 2002
    industrialNews & Features

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