Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
Email Facebook Twitter Google+ LinkedIn Comments

Technique Renders High-Contrast Images of Semiconductor Sites

Photonics Spectra
Aug 2002
A procedure combining optical-beam-induced current imaging and scanning confocal microscopy has produced high-contrast images of semiconductor sites on an integrated chip. Although imaging optically induced current is an effective method for detecting failure or defects on chips, the images typically carry low contrast. Researchers with the National Institute of Physics at the University of the Philippines in Quezon City obtained both optically induced and confocal images from the same focused beam and integrated the data with a simple algorithm to render high-contrast (axial dependent) maps of semiconductor sites in the confocal image.

Similar images are possible with multiphoton microscopes, but the technique, described in the July 10 issue of Applied Optics, achieves comparable results with less-expensive confocal instruments.

As We Go To PressBreaking NewsMicroscopyPresstime Bulletin

Terms & Conditions Privacy Policy About Us Contact Us
back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2018 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA,

Photonics Media, Laurin Publishing
x Subscribe to Photonics Spectra magazine - FREE!
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.