AUSTIN, Texas, and TOKYO, July 4 -- International SEMATECH (ISMT) and Asahi Glass Co. Ltd. have signed an agreement to collaborate on developing advanced mask technology and materials for use in EUV lithography. In addition to providing ISMT with advanced mask materials, Asahi will send scientists to work with ISMT technologists at International SEMATECH North, the consortium's advanced research and development (R&D) facility at the University at Albany (UAlbany), State University of New York. Asahi will us ISMT's state-of-the-art tools at UAlbany to further technology development for its commercial manufacturing efforts. Earlier this year, ISMT entered into a five-year strategic alliance with UAlbany to develop EUV infrastructure for industry needs in 2007. The program focuses on defect-free masks and special resists. An estimated 50-60 ISMT assignees and supporting technologists are expected to staff the program by 2006. "EUV mask technology is complex, requiring significant resources and time to develop. The industry needs to begin development as soon as possible to meet those needs, and AGC's agreement with ISMT is a significant step in that direction," said Seiji Munekata, AGC's executive officer and general manager of its central R&D center. The availability of affordable masks technology and related materials in time for next-generation lithography has been a persistent challenge to the semiconductor industry." International SEMATECH is a global semiconductor technology development consortium that represents the semiconductor manufacturing industry; its members are AMD, Hewlett-Packard, IBM, Infineon, Intel, Motorola, Philips, Texas Instruments and TSMC. Asahi Glass is a multinational company focusing on glass, electronics and displays and chemicals. For more information, visit: www.agc.co.jp or www.sematech.org</a