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Schott Lithotec to Upgrade Mask Blanks for EUV Lithography

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Under a one-year agreement, Schott Lithotec AG of Jena, Germany, will supply International Sematech of Austin, Texas, with mask blanks for use in extreme-UV lithography. The company will follow defined specifications for the improvements and expects to advance its own EUV products and activities in the process. This type of lithography may be the generation following optical lithography. The technology results in a shorter wavelength of 13.5 nm that enables the fabrication of semiconductors with structures less than 45 nm wide. A subsidiary of the German company, Schott Lithotec USA Corp....Read full article

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    Published: November 2003
    BusinessEUV lithographyindustriallight speedSchott Lithotec AGsemiconductorsUV lithography

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