Several techniques improve the performance of objectives used in microlithographic resist development.James E. WebbIn the never-ending quest for the optimal objective for microlithography wavelengths, engineers have worked on ways to improve the aberration and birefringence correction of 0.85-NA Newtonian objectives used in microlithographic resist development. Corning Tropel Corp. has built, tested, optimized and delivered two objectives to customers for use in Exitech microsteppers. 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