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FT Interferometry Measures Homogeneity

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Don Battistoni, Zygo Corp.

Today’s advanced semiconductor applications have pushed the limits of optical lithography systems. While the ability to fabricate optical components to their surface-form specifications is critical, the quality of the glass itself — or more specifically, its homogeneity — can ultimately determine whether it will succeed or fail in an application. For more than 20 years, phase-shifting interferometry has been the technique of choice for measuring homogeneity. However, traditional methods suffer from a variety of issues that not only make the measurement difficult to perform, but also...Read full article

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    Published: March 2004
    Featuresindustrialoptical componentsoptical lithography systemsphase-shifting interferometrysemiconductor applications

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