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Daily News Briefs
Feb 2005
Alpine Research Optics (ARO), of Boulder, Colo., has expanded and reorganized its staff to support the introduction of a new series of off-the-shelf, high-performance laser optics. Chris Rosauer has joined the company as manager of operations. Rosauer was formerly manufacturing manager for Optical Coating Laboratories Inc., a JDS Uniphase company. Wayne Stoner was appointed inside sales manager; he will manage the off-the-shelf optics product line. Before joining ARO, he was a project manager for SVG Lithography in Wilton, Conn.    . . .    Cymer Inc., a San Diego-based supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, installed its 2500th excimer light source for DUV lithography applications, an XLA 100 193-nm argon fluoride (ArF) system, at a Japanese chip manufacturing facility, where it is being used to make integrated circuits with 90-nm and below design rules. Last week, Cymer installed an XL Series light source at IMEC's 300-mm wafer fabrication facility in Leuven, Belgium, launching the company's participation in IMEC's Industrial Affiliation Program (IIAP) on Advanced Lithography, which aimed at accelerating the adoption of immersion lithography.    . . .    Fredric Cramer was named vice president of Konarka Technologies Inc., a Lowell, Mass., developer of polymer photovoltaic products that convert light to energy. Cramer was formerly general manager of Nova Biomedical's diabetes operations division; before that, he worked for 30 years at the Polaroid Corp., most recently as director of integral films media development. He was also director of corporate manufacturing and development strategy and was responsible for Polaroid's photographic light sensitive and receiving sheet coating plant operations.

Alpine Research OpticsCymerdeep ultravioletDUVDUV lithographyexcimer light sourceindustrialKonarkaLaser OpticsNews BriefsPhotonics Tech Briefspolymer photovoltaicsemiconductor

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