Part of the Tutorial Texts in Optical Engineering series, Optical Imaging in Projection Microlithography is an integrated mathematical view of the physics and numerical modeling of optical projection lithography. Offering a system-level survey of the parameter tolerances required in manufacturing, the 273-page volume discusses aberrations, variabilities, oblique rays, numerical computation, basic electromagnetism, resolution and image enhancement, imaging of extended objects with finite sources, and elements of diffraction theory and geometrical optics. Technologists can gather general concepts, and those with knowledge of calculus can follow the step-by-step approach. The book provides an index, bibliography, numerous diagrams, simulator accuracy tests and end-of-chapter exercises. Alfred Kwok-Kit Wong; SPIE Press, Bellingham, Wash., 2005; $46 for SPIE members, $56 for nonmembers.