Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
Email Facebook Twitter Google+ LinkedIn Comments

Intel Supports EUV Source Development

Photonics Spectra
Apr 2006
Intel Corp.’s investment business, Intel Capital, has provided funding to Xtreme technologies GmbH to advance its development of extreme-ultraviolet sources for photolithography at its plants in Jena and Göttingen, Germany. Xtreme is a joint venture of Jenoptik AG in Jena and of Ushio Inc. in Tokyo.

A lithographic technique using an image produced by photography for printing on a print-nonprint, sectioned surface.
Businessextreme-ultraviolet sourcesindustrialIntel Corp.light speedphotolithography

Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2018 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA,
x Subscribe to Photonics Spectra magazine - FREE!