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Alluxa - Optical Coatings LB 8/23
Photonics HandbookMaterials

Data Tables: Optical Thin-Film Materials

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Tables showing parameters of the most frequently used physical vapor deposition materials for a wide variety of applications.

DATA TABLES: OPTICAL THIN-FILM MATERIALS Identification Physical Parameters Material Name Material Formula Transparent Region(µm) (see note a) Index at Wavelength (µm) (see note b) Method/ Holder Evap. Temp. °C) (see note c) OXIDES Aluminum Oxide Al2O3 0.2 - 8 1.65, (0.50) 1.60, (1.00) E-beam W 2100 Chromium Oxide Cr2O3 0.6 - >5 2.20, (>0.8) E-beam Mo 2000 Hafnium Dioxide HfO2 0.25 - 11 2.05, (0.30) 1.98, (0.40) 1.95, (0.50) 1.92, (0.7 - 1.5) E-beam Mo 2500 Indium Oxide In2O3 0.4 - 9 2.05, (0.50) ...Read full article

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