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Zygo Sells New Defect Printability System to Sematech
Mar 1999
MIDDLEFIELD, Conn., March 25 -- Zygo Corp. reports that International Sematech has purchased its new DPS-310 series of inspection/review tools that incorporate TINT Virtual Stepper Mask Defect Analysis software. The software enables customers to examine a photomask for defects during the mask certification process. Customers will be able to identify nuisance OPC-induced defects detected by automatic inspection systems, and determine the impact of mask defects upon process windows and CD control.

The DPS-310 will be delivered to RAVE LLC, an advanced reticle repair tool manufacturer being sponsored by International Sematech to develop the next generation repair tool. This system will be used to verify that the photomask repairs are successful and will not be printed on the wafers.

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