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Edwards, TEL Announce Joint Development Agreement
Nov 2008
Edwards, located in Crawley, West Sussex, UK, has announced that it will jointly develop a perfluorocarbon (PFC) gas abatement system with Tokyo Electron Ltd (TEL) – the PA-01E for etch equipment. The new gas abatement system will be available mid-year 2009. The PA-01E system will help to reduce PFC pollution resulting from the dielectric film etching processes used in semiconductor manufacturing. It will be equipped with a plasma abatement device, collectively developed with Adtec Plasma Technology Co. Ltd., located in Hiroshima, Japan, which offers a high transformation rate and stable operation. It is also designed to have a significantly lower cost-of-ownership due to its reduced requirement for energy, consumables and maintenance. In addition, the PA-01E system will be designed to abate carbon monoxide in addition to PFCs, eliminating the need for additional abatement hardware.

The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...
abatement of carbon monoxideAdtec Plasma Technologydielectric film etching processEdwards photonicsindustrialNews BriefsPA-01Eperfluorocarbon gas abatement systemphotonicsPhotonics Tech BriefsTELTokyo Elecron Ltd.

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