Search Menu
Photonics Media Photonics Buyers' Guide Photonics EDU Photonics Spectra BioPhotonics EuroPhotonics Industrial Photonics Photonics Showcase Photonics ProdSpec Photonics Handbook
More News
Email Facebook Twitter Google+ LinkedIn Comments

TRW Delivers First Laser for Next-Generation Microchips
Apr 1999
REDONDO BEACH, Calif., April 6 -- TRW Inc. says it has delivered the first next-generation laser for extreme ultraviolet (EUV) lithography. The company calls the laser an enabling technology for a new type of EUV light source that will allow chip manufacturers to keep up with world demand for smaller and faster microcircuits for the next 10 to 15 years. The laser was developed under a joint agreement signed in 1997 between TRW and the EUV Limited Liability Company, a consortium of US semiconductor manufacturers led by Intel, Motorola and Advanced Micro Devices.
EUV sources will allow circuit features of less than 0.1 micron, improving the most advanced optical photolithography processes available today by a factor of two. These new, higher precision light sources will lead to microprocessors 100 times more powerful than today's fastest chips and memory chips with 1,000 times more capacity.

industrialNews & Features

Terms & Conditions Privacy Policy About Us Contact Us
back to top

Facebook Twitter Instagram LinkedIn YouTube RSS
©2018 Photonics Media
x We deliver – right to your inbox. Subscribe FREE to our newsletters.