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EVG’s Strategic Win
May 2009
EV Group (EVG) of St. Florian, Austria, a wafer bonding and lithography equipment supplier for the MEMS, nanotechnology and semiconductor markets, has announced that Fraunhofer Institute for Applied Optics and Precision Engineering IOF has selected EVG’s UV-based nanoimprint lithography (UV-NIL) step-and-repeat system for its optoelectronic research efforts. The institute will use the UV-NIL stepper for microlens mastering and molding for micro-optics applications, including fiber optics and CMOS image sensors for wafer-level cameras, among other nanoimprinting applications.

Tiny (less than 2 mm in diameter) lenses, beamsplitters and other optical components used, for example, in endoscopes or microscopes or to focus light from semiconductor lasers and optical fibers.
The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...
CMOS image sensorsEmploymentEV GroupEVGfiber opticsFraunhoferFraunhofer Institute for Applied Optics and Precision Engineering IOFindustrialMicro-Lens Mastering and Moldingmicro-opticsnanoimprintingNews BriefsphotonicsPhotonics Tech BriefsSensors & DetectorsUV-based Nanoimprint LithographyUV-NILwafer-level cameras

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