CEA-Leti Project Aims to Improve Sub-28nm Node Yields
GRENOBLE, France, April 8, 2010 — CEA-Leti, a global research center committed to creating and commercializing innovation in micro- and nanotechnologies, announced that its Hybrid Metrology Project has developed a way to reduce measurement uncertainty in the sub-28nm nodes.
The project has shown results in reducing measurement uncertainty at sub-28nm nodes using an alternative 3D-AFM mode for CD measurement. Known as the deep trench mode, traditionally used for height measurement, it can be extended for certain applications to reach nanometer-scale accuracy of CD measurements employing certain optimized scan parameters.
The findings have shown significant limitations to aggressive trench-dimension measurements using the conventional 3D-AFM CD mode.
CD hybrid metrology potentially could be introduced in high-volume manufacturing for sub-28nm nodes. It would require hybrid metrology tools and software that simplify communication and optimization of complementary techniques to obtain a relevant and CD metrology configuration.
This platform would facilitate and optimize data exchange between reference and production techniques. The number of measurement iterations would be decreased as a function of accuracy control because it would prevent introduction of residual errors due to poor accuracy of the initial production CD metrology technique.
The project intends to develop all methodology and infrastructure needed to introduce hybrid metrology into high-volume manufacturing.
For more information, visit: www.leti.fr
- The science of measurement, particularly of lengths and angles.
- The use of atoms, molecules and molecular-scale structures to enhance existing technology and develop new materials and devices. The goal of this technology is to manipulate atomic and molecular particles to create devices that are thousands of times smaller and faster than those of the current microtechnologies.
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