104 W EUV Light Source Output Achieved

Gigaphoton Inc., a lithography light source manufacturer, announced that an extreme ultraviolet (EUV) light source developed by the technology consortium Extreme Ultraviolet Lithography System Development Association has achieved 104 W — the world’s highest output.

The milestone signals a step forward in the industry for the realization of the first volume-production-worthy EUV light source shipment targeted for 2011. Made under the Laser Produced Plasma (LPP) Light Source Development Program for EUV Lithography, it is promoted by EUVA.

As a member of the EUVA, the company has been working on the development of LLP light sources for EUV lithography since 2002.

One of the biggest challenges facing EUV lithography tools is the ability to achieve a higher output power, which is critical for volume production applications.

The company’s achievement in the area is a result of years work in EUV light source technology, which includes breakthroughs in the use of tin targets and carbon dioxide lasers for improved conversion efficiency, as well as the use of magnetic fields for debris removal.

For more information, visit: www.gigaphoton.com

Published: May 2010

Glossary

extreme ultraviolet: Extreme ultraviolet (EUV) refers to a specific range of electromagnetic radiation in the ultraviolet part of the spectrum. EUV radiation has wavelengths between 10 and 124 nanometers, which corresponds to frequencies in the range of approximately 2.5 petahertz to 30 exahertz. This range is shorter in wavelength and higher in frequency compared to the far-ultraviolet and vacuum ultraviolet regions. Key points about EUV include: Source: EUV radiation is produced by extremely hot and energized...
lithography: Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
ultraviolet: That invisible region of the spectrum just beyond the violet end of the visible region. Wavelengths range from 1 to 400 nm.

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