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Photonis Awarded US Patent

Photonics.com
May 2010
STURBRIDGE, Mass., May 24, 2010 — Electro-optics manufacturer Photonis USA announced that the US Patent Office has awarded it a patent for an etching manufacturing process used to create glass microwell plates.

The patent is the second to be awarded to the company in 2010 and the 13th awarded overall.

Used to hold samples for biologic and genomic analysis, the glass wafer plates comprise millions of individual glass wells that are typically less than 32 µm in diameter and have a uniform depth of less than the thickness of the overall plate. The well depth prevents samples from co-mingling on the same plate while allowing multiple sample analyses to be performed simultaneously.

The company was awarded the patent for its unique etching process, which provides uniformity of depth to each well while preserving the rigidity of the glass sample plate. Both qualities are important to ensure that samples are undiluted and to prevent damage to the analytical equipment.

For more information, visit: www.photonis.com 

GLOSSARY
electro-optics
1. The branch of physics that deals with the use of electrical energy to create or manipulate light waves, generally by changing the refractive index of a light-propagating material; 2. Collectively, the devices used to affect the intersection of electrical energy and light. Compare with optoelectronics.
etching
The engraving of a surface by acid, acid fumes or a tool; a process extensively used in the manufacture of reticles.
Americasbiologic analysisbiologicalbiophotonicsBusinessco-minglingelectro-opticsetchinggenomic analysisglass microwell platesglass wafer platesglass wellsindustrialmanufacturing processopticspatentsPhotonisPhotonis USArigiditysamplesample analysisthicknessundiluteduniform depthUS Patent OfficeWafers

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