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Metrology System Advances Photomasks

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JENA, Germany, Aug. 16, 2010 — Sematech and the Semiconductor Metrology Systems (SMS) division of Carl Zeiss announced recently that Zeiss’ next-generation photomask registration and overlay metrology system has passed a key development milestone. The jointly developed system, called Prove, demonstrated advanced photomask measurement capability for the 32-nm node and below. In a series of test runs, the key specifications — 0.5-nm repeatability and 1.0-nm accuracy in image placement, registration and overlay measurement — were verified. “The mask pattern placement metrology tool project builds...Read full article

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    Published: August 2010
    Glossary
    image contrast
    Also referred to as image visibility, the contrast of an image is the variation in the intensity of an image formed by an optical system, where the image pixels are defined on a gray scale scheme of black being the dimmest and white being the brightest intensity values. Image contrast is then quantified by the expression: (I_max - I_min) / (I_max + I_min), where I_max and I_min are the maximum and minimum points of intensity in the image.
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    metrology
    Metrology is the science and practice of measurement. It encompasses the theoretical and practical aspects of measurement, including the development of measurement standards, techniques, and instruments, as well as the application of measurement principles in various fields. The primary objectives of metrology are to ensure accuracy, reliability, and consistency in measurements and to establish traceability to recognized standards. Metrology plays a crucial role in science, industry,...
    photomask
    A photomask, also known simply as a mask or reticle, is a key component in the photolithography process used in semiconductor manufacturing and other areas of microfabrication. It is a high-precision plate or glass substrate that carries a pattern of opaque and transparent regions. Photomasks are crucial for transferring intricate patterns onto semiconductor wafers during the photolithography process. The photomask is typically placed in the optical path between a light source and a...
    193-nm-wavelength imaging optics32-nm nodeAerial Image Metrology SystemsBryan RiceCarl ZeissDr. Oliver KienzleEuropeEUV technologyflexible illuminatorGermanyimage contrastimage placement errorsImagingindustrialInternational Technology Roadmap for SemiconductorsLight Sourceslithographymemory devicesmetrologyOpticspatterning methodsphotomaskPROVEResearch & TechnologySematechSemiconductor Metrology SystemsTest & Measurement

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