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Lithography System Order

Photonics Spectra
Dec 2010
Vistec Lithography Inc. of Watervliet, N.Y., has announced that AMO GmbH of Aachen, Germany, a nanotechnology research service provider, has placed an order for its EBPG5200 electron beam lithography system. The instrument can generate structures less than 8 nm on varying substrates and part sizes from a few millimeters to 200 mm in diameter. The system incorporates an interactive graphical user interface for ease of use in multiuser environments.

The use of atoms, molecules and molecular-scale structures to enhance existing technology and develop new materials and devices. The goal of this technology is to manipulate atomic and molecular particles to create devices that are thousands of times smaller and faster than those of the current microtechnologies.
AMO GmbHBusinessEBPG5200electron beam lithographygraphical user interfaceindustriallight speedlithographymillimetermulti-user environmentnanonanotechnologysubstrateVistec Lithography Inc.

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