Search
Menu
CASTECH INC - New Building the Bridge of Light

Zygo Wins $9M Contract for EUV Tool Optics

Facebook X LinkedIn Email
MIDDLEFIELD, Conn., and ALBANY, N.Y., Oct. 27, 2011 — Optical metrology supplier Zygo Corp.’s Optical Systems Div. has been awarded a $9 million contract with the College of Nanoscale Science and Engineering (CNSE) at the University at Albany and the SEMATECH consortium of chipmakers to develop extreme ultraviolet (EUV) lithography optics. The optics will be incorporated in the next, fifth-generation, Micro-Exposure Tool (MET-5) at CNSE’s Albany NanoTech Complex.

The MET-5 program is managed by the SEMATECH consortium, whose members and partners include leading semiconductor manufacturing companies worldwide. The program is intended to aid researchers in extending semiconductor lithography resolution capability to less than 16 nm. This supports EUV resist and EUV mask developments intended to meet the international technology road map for semiconductors and associated decreasing linewidths.

Advanced development and production is expected to take place over a 22-month period and will be carried out by Zygo’s Extreme Precision Optics operation in Richmond, Calif.

For more information, visit: www.zygo.com  
Gentec Electro-Optics Inc   - Measure Your Laser MR


Published: October 2011
Glossary
metrology
Metrology is the science and practice of measurement. It encompasses the theoretical and practical aspects of measurement, including the development of measurement standards, techniques, and instruments, as well as the application of measurement principles in various fields. The primary objectives of metrology are to ensure accuracy, reliability, and consistency in measurements and to establish traceability to recognized standards. Metrology plays a crucial role in science, industry,...
Albany NanoTech ComplexAmericasBusinessCaliforniaCNSECollege of Nanoscale Science and EngineeringConnecticutEUV lithography opticsEUV mask developmentEUV opticsExtreme Precision OpticsindustrialMET-5metrologyMicro-Exposure ToolNew Yorkoptical metrologyOptical Systems DivisionOpticsSematechsemiconductor lithographysemiconductorsUniversity at AlbanyZygo

We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.