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Zygo Wins $9M Contract for EUV Tool Optics
Oct 2011
MIDDLEFIELD, Conn., and ALBANY, N.Y., Oct. 27, 2011 — Optical metrology supplier Zygo Corp.’s Optical Systems Div. has been awarded a $9 million contract with the College of Nanoscale Science and Engineering (CNSE) at the University at Albany and the SEMATECH consortium of chipmakers to develop extreme ultraviolet (EUV) lithography optics. The optics will be incorporated in the next, fifth-generation, Micro-Exposure Tool (MET-5) at CNSE’s Albany NanoTech Complex.

The MET-5 program is managed by the SEMATECH consortium, whose members and partners include leading semiconductor manufacturing companies worldwide. The program is intended to aid researchers in extending semiconductor lithography resolution capability to less than 16 nm. This supports EUV resist and EUV mask developments intended to meet the international technology road map for semiconductors and associated decreasing linewidths.

Advanced development and production is expected to take place over a 22-month period and will be carried out by Zygo’s Extreme Precision Optics operation in Richmond, Calif.

For more information, visit:  

The science of measurement, particularly of lengths and angles.
Albany NanoTech ComplexAmericasBusinessCaliforniaCNSECollege of Nanoscale Science and EngineeringConnecticutEUV lithography opticsEUV mask developmentEUV opticsExtreme Precision OpticsindustrialMET-5metrologyMicro-Exposure ToolNew Yorkoptical metrologyOptical Systems DivisionopticsSematechsemiconductor lithographysemiconductorsUniversity at AlbanyZygo

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