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New EUV Microscope to Lead to Next-Gen Semiconductors

BERKELEY, Calif., Nov. 2, 2011 — Delving into the extreme ultraviolet wavelengths further than ever, a novel microscope is set to provide leaps forward in photolithography technology. The device, dubbed SHARP (for “Semiconductor High-NA Actinic Reticle Review Project”), will have higher resolution, speed, illumination...Read full article

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