Nanopatterning Agreement Signed
ST. FLORIAN, Austria, Jan. 23, 2012 — EV Group (EVG) has signed a joint development and licensing agreement with Eulitha AG to establish a low-cost-of-ownership nanopatterning solution for high-brightness LED manufacturing.
EVG will integrate Eulitha’s Phable mask-based UV photolithography technology with its own automated mask aligner product platform. Demo capabilities are in place, and the first products are expected to ship later this year.
This hexagonal pattern of 300-nm diameter holes was generated by Eulitha’s Phable mask-based UV photolithography technology. (Image: PRNewsFoto/EV Group)
Combining Eulitha’s full-field exposure technology with EVG’s mask alignment platform enables automated fabrication of photonic nanostructures over large areas, and supports the production of energy-efficient LEDs, liquid crystal displays and solar cells. The combination is suited for patterning sapphire substrates to enhance the light extraction of LED devices.
EVG plans to offer a Phable-enabled EVG620 system as an extension of its mask alignment platform.
Eulitha, a spinoff of the Paul Scherrer Institute in Switzerland, develops lithographic technologies for optoelectronics, photonics, biotechnology and data storage applications.
EV Group supplies wafer bonding and lithography equipment for the MEMS, semiconductor and nanotechnology markets.
For more information, visit: www.evgroup.com