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PI Physik Instrumente - Revolution In Photonics Align LW LB 3/24

Nanopatterning Agreement Signed

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EV Group (EVG) has signed a joint development and licensing agreement with Eulitha AG to establish a low-cost-of-ownership nanopatterning solution for high-brightness LED manufacturing. EVG will integrate Eulitha’s Phable mask-based UV photolithography technology with its own automated mask aligner product platform. Demo capabilities are in place, and the first products are expected to ship later this year. This hexagonal pattern of 300-nm diameter holes was generated by Eulitha’s Phable mask-based UV photolithography technology. (Image: PRNewsFoto/EV Group) ...Read full article

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    Published: January 2012
    Glossary
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    nano
    An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
    nanotechnology
    The use of atoms, molecules and molecular-scale structures to enhance existing technology and develop new materials and devices. The goal of this technology is to manipulate atomic and molecular particles to create devices that are thousands of times smaller and faster than those of the current microtechnologies.
    photolithography
    Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer geometric patterns from a photomask or reticle to a photosensitive chemical photoresist on a substrate, typically a silicon wafer. The basic steps of photolithography include: Cleaning the substrate: The substrate, often a silicon wafer, is cleaned to remove any contaminants from its surface. ...
    AustriaBusinessConsumerDisplaysenergyEulitha AGEuropeEV GroupEVGEVG620green photonicsHB-LEDhigh-brightness LEDindustriallight emitting diodesLight Sourceslight speedliquid crystal displayslithographymask alignermask-based ultraviolet photolithographyMEMSnanonanopatterningnanopatterning solutionsnanotechnologyPaul Scherrer InstitutePhablephotolithographysemiconductorssolar cellsSwitzerlandLEDs

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