Eulitha to Provide Photolithography System for Chinese Institute
WÜRENLINGEN, Switzerland, Aug. 20, 2015 — Lithography equipment developer Eulitha AG has received an order for its PhableR 100 photolithography tool from the Changchun Institute of Optics, Fine Mechanics and Physics in China. Terms of the sale were not disclosed.
The PhableR 100 will be installed at the National Key Laboratory of Applied Physics, where research topics include crystal optics, micro and nano devices and systems, shortwave optics, optical information integration, information security, space optics, and remote sensing.
The system incorporates displacement Talbot lithography technology, allowing researchers to print periodic patterns with feature sizes below 150 nm without severely limiting flatness or conductivity requirements.
Eulitha specializes in the development of lithographic technologies for applications in the optoelectronics and photonics fields. It is a spinoff of the Paul Scherrer Institute in Villigen.
For more information, visit www.eulitha.com.
- A lithographic technique using an image produced by photography for printing on a print-nonprint, sectioned surface.
- A sub-field of photonics that pertains to an electronic device that responds to optical power, emits or modifies optical radiation, or utilizes optical radiation for its internal operation. Any device that functions as an electrical-to-optical or optical-to-electrical transducer. Electro-optic often is used erroneously as a synonym.
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