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Gigaphoton Test KrF Excimer Laser

Photonics Spectra
Feb 2017
OYAMA, Japan — Semiconductor lithography light source manufacturer Gigaphoton Inc. has begun testing a new krypton fluoride (KrF) excimer laser, a light source for the annealing process at large-scale liquid crystal display manufacturing plants.

Testing is taking place within a mass production line at a panel manufacturer. Designed to be a high-output KrF excimer laser at 600 W, the product is expected to be an annealing light source for panel manufacturers both within Japan and abroad as demand for large-scale panels with even greater resolutions increases.

Gigaphoton is aiming to ship the first mass-produced models of the KrF excimer laser in the summer of 2017.

Gigaphoton is a developer of excimer laser, extreme UV and lithography light sources.


GLOSSARY
excimer laser
A rare-gas halide or rare-gas metal vapor laser emitting in the ultraviolet (126 to 558 nm) that operates on electronic transitions of molecules, up to that point diatomic, whose ground state is essentially repulsive. Excitation may be by E-beam or electric discharge. Lasing gases include ArCl, ArF, KrCl, KrF, XeCl and XeF.
GigaphotonKrFexcimer laserkrypton fluorideAsia-PacificBusinesslight sourceslasersindustriallight speed

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