An Opportunity to Learn About Transition Mode Reactive Sputtering by PEM Control

Pulsed DC reactive sputtering techniques are used in both research and production to overcome many of the difficulties inherent with RF reactive sputtering. Pulsed DC reactive sputtering typically exhibits an order of magnitude greater deposition rates than do RF techniques. However, Pulsed DC reactive sputtering of a fully reacted target can still exhibit low deposition rates and limited operating windows. In the thin film industry, the most efficient process condition for reactive sputtering of insulating materials is in transition mode with the use of Pulsed DC power. Operating in these conditions enables the delivery of high-rate reactive sputtering with a broader range of film properties. 

Fixed gas flows are often unstable in controlling the reactive sputter process in a transition state. Rapid and precise control of the reactive gas partial pressure is usually required to enable process operation in transition mode. 

Plasma Emission Monitoring, or PEM, is a robust technique used to control reactive gas partial pressure for transition mode reactive sputtering. DV-PEM (Denton Vacuum-PEM) uses the emission spectra of a reactively sputtered plasma species for rapid control of the reactive gas partial pressure through a closed loop PID (Proportional, Integral and Derivative).

If you would like to learn more about the architecture and operation of a PEM system integrated into a Denton Vacuum sputtering chamber (DV-PEM), with confocal cathode configuration, please join us for a free, concise webinar with Denton Vacuum’s CTO, George Papasouliotis, Ph.D. He will cover everything you need to know about pulsed DC reactive sputtering with PEM, and about Denton Vacuum’s PEM, which is fully integrated with its thin film deposition system.

Webinar takes place Wednesday, March 15, 1-2 pm EDT. Sign up is easy – register today.