Machine tool and laser systems developer Trumpf GmbH & Co. KG has acquired an 85 percent stake in CO2 laser developer Access Laser Co. With this acquisition, Trumpf aims to integrate a part of the extreme ultraviolet (EUV) technology supply chain. Access’ lasers are used to fabricate microchips in EUV lithography, where the light generated by the low-power CO2 lasers serves as a beam source deployed together with Trumpf laser amplifiers in EUV systems. “Access Laser is a core partner in our EUV business and a highly innovative laser company,” said Peter Leibinger, managing partner and chief technology officer of Trumpf. “Together, we will be working even closer to further improve the EUV performance as well as serving more applications and customers looking for innovative low-power CO2 lasers.” Access Laser also caters to applications in the medical, electronics and scientific markets. “The successful partnership of technologies of Trumpf and Access Laser in EUV shows the inherent synergy of the two companies,” said Yong Zhang, founder and president of Access Laser. “We look forward to enhancing this synergy as a member of the Trumpf Group.” Access Laser’s product portfolio includes precision lasers with low-output powers between 100 mW and 50 W, as well as lasers with peak powers as high at 1 kW. Trumpf is a provider of machine tools and lasers for industrial production.