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Photronics and ASML to Develop Reticles for 0.10-µm Imaging
Jun 2000
JUPITER, Fla., June 14 -- Photronics Inc. and ASML have agreed to work together to develop advanced reticles to support the early characterization work of ASML's most advanced lithography systems. ASML MaskTools, a subsidiary of ASML, will provide optical extension technologies to enhance photolithography process latitude and improve IC yields in manufacturing. Terms of the joint development agreement were not disclosed.
Reticles will be used to evaluate wafer results on ASML's 248-nm and 193-nm lithography systems. Photronics' research and development team will create reticles by using the company's lithography tools and development processes as extensions of Photronics' sub-wavelength reticle solutions process families. ASML will supply the reticle patterns for lines, spaces, and contact holes required for system characterization.
As members of IMEC -- a European independent research center for the development and licensing of microelectronic technologies -- ASML and Photronics will work in conjunction with the research center to gather performance data on the reticles and the lithography systems using them.

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