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ASML Acquiring Brion Technologies for $270M

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VELDHOVEN, the Netherlands, Dec. 19, 2006 -- Semiconductor scanner manufacturer ASML Holding NV announced today it will acquire privately held Brion Technologies Inc. of Santa Clara, Calif., a provider of semiconductor design and wafer manufacturing products for advanced lithography, for $270 million in cash.

Brion's computational lithography technology enables semiconductor manufacturers to simulate the realized pattern of integrated circuits and to correct the mask pattern to optimize the manufacturing process and yield. Founded in 2002, Brion is involved in the rapidly growing field of computational lithography which encompasses design verification, reticle enhancement technologies and optical proximity correction.

"This combination extends significantly ASML capabilities to support the semiconductor industry as our complementary technologies can enhance further the efficiency of chip manufacturing," said Eric Meurice, president and CEO of ASML. "Brion's simulation technology combined with ASML's lithography systems will generate value for customers through faster time to market, better imaging quality and higher yield in wafer manufacturing." Meurice said combining the two companies will put ASML in a good position as its customers require increasingly advanced lithography tools with optimization capabilities as they pursue the newest chip designs and most advanced technology nodes.

Other than the $270 million (€203 million) purchase price, details of the transaction were not disclosed. Notwithstanding Brion's operational results during 2007, ASML estimates non-cash acquisition accounting related charges of approximately $38 million (€29 million) after tax in 2007. ASML said it expects Brion to be cash positive in 2007.

Subject to approval by regulatory authorities, closing is expected in the first quarter 2007. Following completion, Brion will operate as a wholly owned subsidiary of Veldhoven-based ASML.

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Dec 2006
1. A localized fracture at the end of a cleaved optical fiber or on a glass surface. 2. An integrated circuit.
1. A framelike structure that serves to restrict the viewing area of the screen when placed before a television picture tube. 2. In photolithography, a photomask (or mask) is typically a patterned transparent plate or an opaque plate with patterned holes or transparencies that uses a laser light source to transfer and print the pattern by an etching process onto a substrate that is typically a silicon wafer used in integrated circuitry.
The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...
acquisitionsAdvanced LithographyASMLBrionBrion TechnologieschipEmploymentindustrialintegrated circuitslithographymaskNews & FeaturesphotonicssemiconductorstransactionWafers

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