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Collaboration Draws Federal Prize

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Trumpf, Zeiss, and the Fraunhofer Institute for Applied Optics and Precision Mechanics were awarded the Deutscher Zukunftspreis 2020 (German Future Prize 2020) for their project “EUV Lithography: New Light for the Digital Age.”

The research effort drew on the respective expertise of experts from each institution, yielding a process based on extreme-UV (EUV), which allows for the energy-efficient and cost-effective fabrication of microchips. The award granted the companies €250,000, which Trumpf and Zeiss will be donating to charity. President Frank-Walter Steinmeier of Germany presented the award Nov. 25 in Berlin under pandemic restrictions in the Verti Music Hall.

Photonics Spectra
Feb 2021
BusinessawardsawardGerman Future PrizeZeissTrumpfFraunhoferFraunhofer Institute for Applied OpticsEuropelaserslithographyEUVEUV lithographyopticsmicrochipmicrochip fabricationlight speed

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