Collaboration Draws Federal Prize

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Trumpf, Zeiss, and the Fraunhofer Institute for Applied Optics and Precision Mechanics were awarded the Deutscher Zukunftspreis 2020 (German Future Prize 2020) for their project “EUV Lithography: New Light for the Digital Age.”

The research effort drew on the respective expertise of experts from each institution, yielding a process based on extreme-UV (EUV), which allows for the energy-efficient and cost-effective fabrication of microchips. The award granted the companies €250,000, which Trumpf and Zeiss will be donating to charity. President Frank-Walter Steinmeier of Germany presented the award Nov. 25 in Berlin under pandemic restrictions in the Verti Music Hall.

Published: November 2020
BusinessawardsawardGerman Future PrizeZeissTrumpfFraunhoferFraunhofer Institute for Applied OpticsEuropeLaserslithographyEUVEUV lithographyOpticsmicrochipmicrochip fabricationlight speed

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