Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics Spectra BioPhotonics EuroPhotonics Vision Spectra Photonics Showcase Photonics ProdSpec Photonics Handbook
More News

Companies Ally Again to Develop Lithography

Facebook Twitter LinkedIn Email Comments
Rohm and Haas Electronic Materials, a Marlborough, Mass., supplier of lithography materials for the semiconductor industry, and Dow Corning Corp. of Midland, Mich., have renewed their joint agreement to develop spin-on silicon hard-mask antireflection coatings products for sub-65-nm node flash, dynamic random access memory and logic integrated circuit devices. The companies’ initial collaboration began two years ago, producing spin-on hardmask material that is being used in high-volume flash memory production.

Dow Corning will supply the resins that provide high silicon content when incorporated into Rohm and Haas coatings.

Photonics Spectra
Oct 2006
antireflection coatingsBusinesscoatingsindustriallight speedrohm and haassemiconductor industry

Comments
back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2019 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA, info@photonics.com

Photonics Media, Laurin Publishing
x Subscribe to Photonics Spectra magazine - FREE!
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.