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Companies Ally Again to Develop Lithography

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Rohm and Haas Electronic Materials, a Marlborough, Mass., supplier of lithography materials for the semiconductor industry, and Dow Corning Corp. of Midland, Mich., have renewed their joint agreement to develop spin-on silicon hard-mask antireflection coatings products for sub-65-nm node flash, dynamic random access memory and logic integrated circuit devices. The companies’ initial collaboration began two years ago, producing spin-on hardmask material that is being used in high-volume flash memory production.

Dow Corning will supply the resins that provide high silicon content when incorporated into Rohm and Haas coatings.

Photonics Spectra
Oct 2006
antireflection coatingsBusinesscoatingsindustriallight speedrohm and haassemiconductor industry

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