Search Menu
Photonics Media Photonics Marketplace Photonics Spectra BioPhotonics EuroPhotonics Vision Spectra Photonics Showcase Photonics ProdSpec Photonics Handbook

Corning Glass Performs Well in Study

Facebook Twitter LinkedIn Email Comments
A durability study performed by International Sematech Inc. of Austin, Texas, has found that Corning HPFS glass performs well under exposure to 193-nm light, said Corning Inc. of Corning, N.Y. The study examined the performance of fused silica samples from five manufacturers in a scaling law test, designed to simulate the effects of argon-fluoride laser radiation on exposure lenses for 193-nm semiconductor lithography.

Corning's glass displayed no trend in wavefront distortion after 14 billion pulses, showing densification of less than 10 nm. Exposure at fluence levels of between 0.0063 and 0.12 mJ/cm2 had little effect on wavefront distortion through 22 billion pulses.

Photonics Spectra
Aug 2001
industrialResearch & TechnologyTech Pulse

view all
Search more than 4000 manufacturers and suppliers of photonics products and services worldwide:

back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2021 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA, [email protected]

Photonics Media, Laurin Publishing
x Subscribe to Photonics Spectra magazine - FREE!
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.