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Raytheon Company has appointed John D. Harris as vice president of contracts, replacing Richard Foley, who retired after 36 years of service.   . . .   Ultratech Inc., a supplier of photolithography systems used to manufacture semiconductors and nanotechnology devices, has received orders for its Saturn Spectrum 3e bump lithography stepper from four liquid crystal display (LCD) driver manufacturers and gold bump foundries located in Japan, China and Taiwan. The steppers, which will be used for gold bump applications, began shipping early this year.   . . .   The Optical Society of America has announced the recipients of its annual awards for their achievements in the optics field. Winners include: Herbert Walther, Ives Medal/Quinn Endowment; David Hanna, Charles H. Townes Award; Ajoy Ghatak, Esther Hoffman Beller Medal; Charles M. Vest, OSA Leadership Award/New Focus Prize; Alexei Vladimirovich Sokolov, Adolph Lomb Medal; Christopher Dainty, C. E. K. Mees Medal; Roland V. Shack, Richardson Medal; George Ian Stegeman, R.W. Wood Prize; Weilin Pan, Allen Prize; Howard John Carmichael, Max Born Award; Yoshiki Ichioka, Fraunhofer Award/Burley Prize; Joe C. Campbell, Nick Holonyak, Jr. Award; Shaul Mukamel, Ellis R. Lippincott Award; and Daniel R. Grischkowsky, William F. Meggers Award.
Jun 2003
The use of atoms, molecules and molecular-scale structures to enhance existing technology and develop new materials and devices. The goal of this technology is to manipulate atomic and molecular particles to create devices that are thousands of times smaller and faster than those of the current microtechnologies.
A lithographic technique using an image produced by photography for printing on a print-nonprint, sectioned surface.
bump lithography stepperindustrialnanotechnologyNews BriefsOptical Society of AmericaphotolithographyPhotonics Tech BriefsRaytheonsemiconductorsUltratech

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