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DuPont Photomasks Orders Pattern Generatorsfrom Micronic Laser Systems
Oct 2000
ROUND ROCK, Texas, Oct. 18 -- Micronic Laser Systems has received an order for one of its newly developed 0.13µm and two of its 0.18 µm-capable patter generators from DuPont Photomasks Inc(DPI). This was the first order for Micronic Laser System's 0.13 µm-capable Sigma tool using spatial light modulator technology, as well as the first and third for its Omega6500 production tools.
Ordering and installing these Micronic tools allows DPI to expand its 'mix and match' mask pattern generator strategy to produce the industry's most technologically advanced photomasks with the lowest cost of ownership, said Preston Adcox, DPI's president and COO. Photomask technology is widely recognized as critical to the semiconductor industry's ability to stay on Moore's Law. These new systems will help DPI to better meet the needs of our diverse, global customer base.
Micronic Laser Systems and DPI reached a joint agreement more than a year ago aimed at developing such systems for the growing semiconductor market.

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