EUV Tool Produces Images

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ALBANY, N.Y., April 3, 2007 -- Less than six months after taking delivery of the first full-field, extreme-ultraviolet alpha demo tool (EUV ADT), the College of Nanoscale Science and Engineering at the University at Albany (UAlbany) has produced the first exposed images while using it in a development environment. ualbany1.jpg

The announcement was made at a presentation at the SPIE Advanced Lithography 2007 conference, held recently in San Jose, Calif.

ualbany2.jpgThe $65 million EUV ADT, developed by Netherlands-based ASML Holding NV, a supplier of advanced lithography tools, will be essential in development of the infrastructure for EUV lithography and is considered the most likely technology for insertion into manufacturing as early as the 32-nm computer chip device node, based on cost-effectiveness and ability to extend to future nodes, according to ASML.ualbany3.jpg

The production of images from the EUV ADT supports the R&D programs of the International Venture for Nanolithography (INVENT), a global industry-university consortium for R&D, education and technology deployment for nanolithography applications. INVENT was created with assistance from the New York State Assembly and includes computer-chip manufacturers Advanced Micro Devices, IBM, Micron Technology and Qimonda. Other global corporate partners of CNSE, including SONY and Toshiba, also participate in the CNSE EUV programs.

EUV-ADT tool shows 32-nm half-pitch (HP) and contact-hole (CH) printing. Above, top to bottom: 3-nm HP, focus depth >160 nm; 32-nm HP; 32-nm dense CH. Resist: 100-nm MET-2D. NA=0.25, =0.5 (conventional illumination) imaging POB (16% flare). (Images courtesy of UAlbany)
ASML has an R&D center at the New York State Center of Excellence in Nanoelectronics and Nanotechnology, at CNSE's Albany NanoTech complex, the International Multiphase Partnership for Lithography Science and Engineering. The ASML R&D Center is its only 300-mm-wafer R&D facility outside of its headquarters in the Netherlands.

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Published: April 2007
An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...
That invisible region of the spectrum just beyond the violet end of the visible region. Wavelengths range from 1 to 400 nm.
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