Search Menu
Photonics Media Photonics Buyers' Guide Photonics Spectra BioPhotonics EuroPhotonics Vision Spectra Photonics Showcase Photonics ProdSpec Photonics Handbook
More News

Full-Field Exposure System Ordered for R&D

Facebook Twitter LinkedIn Email Comments
Austin, Texas-based International Sematech, a nonprofit R&D consortium of 13 semiconductor manufacturers, announced that it has ordered a 193-nm full-field exposure system from Silicon Valley Group Lithography Systems of Wilton, Conn. The ArF device, which will be housed at the consortium's Advanced Tool Development Facility, will enable researchers to conduct resist and reticle development at feature sizes less than 130 nm.

Semiconductor manufacturing currently employs 248-nm optical lithography tools to produce 180-nm resolution. The companies are testing the use of 157-nm sources to produce chips with 90-nm features. International Sematech is investigating postoptical and next-generation lithography to create 70-nm features.

Photonics Spectra
Mar 2000
Businessindustriallight speed

back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2019 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA,

Photonics Media, Laurin Publishing
x Subscribe to Photonics Spectra magazine - FREE!
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.