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Gigaphoton Reaches Milestone

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OYAMA, Japan, Dec. 15, 2011 — Lithography light source manufacturer Gigaphoton Inc. has shipped its 1000th excimer laser for semiconductor photolithography.

Komatsu, Gigaphoton’s predecessor, marketed Japan’s first excimer laser in 1985, followed by the world’s first excimer laser for semiconductor photolithography in 1987. Since then, Gigaphoton has developed and marketed excimer laser units that pursue finer resolutions, higher throughput and lower running cost to meet the needs of the semiconductor industry.

Gigaphoton’s next-generation ArF excimer laser for multipatterning immersion lithography scanners, the GT63A series, was created to meet customers’ needs for reducing running cost, and for achieving higher uptime, wider depth of focus and higher stability.

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Dec 2011
A lithographic technique using an image produced by photography for printing on a print-nonprint, sectioned surface.
ArF excimer laserAsia-PacificBusinessexcimer lasersGigaphotonGT63A seriesindustrialJapanlight speedlithographylithography light sourcesmultipatterning immersion lithography scannerphotolithographysemiconductor photolithographylasers

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