Search Menu
Photonics Media Photonics Marketplace Photonics Spectra BioPhotonics Vision Spectra Photonics Showcase Photonics ProdSpec Photonics Handbook

Gigaphoton reports 2-h-straight run for EUV source

Facebook Twitter LinkedIn Email
Gigaphoton Inc.’s extreme UV (EUV) laser-produced plasma (LPP) light source has achieved 2-h continuous operation. The milestone was confirmed using a prototype LPP system that generates EUV light by irradiating tin droplets with a solid-state prepulse laser and a CO2 main-pulse laser. “We will continue our efforts to help to bring the industry closer to realizing EUV lithography tools for high-volume manufacturing,” said President and CEO Hitoshi Tomaru.

Based in Oyama, Japan, the lithography light source manufacturer also announced it has delivered its first ArF immersion excimer laser to a major lithography scanner manufacturer. The GT64A laser produces variable power outputs ranging from 90 to 120 W for multipatterning in 450-mm wafer production applications.

Photonics Spectra
Sep 2013
ArF immersion excimer laserAsia-PacificBusinessEUV lithographyGigaphotonGT64A laserhigh volume manufacturingHitoshi TomaruindustrialJapanlaser-produced plasma light sourcelight speedLPPmultipatterningopticswafer productionWafers

back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2023 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA, [email protected]

Photonics Media, Laurin Publishing
x Subscribe to Photonics Spectra magazine - FREE!
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.