Close

Search

Search Menu
Photonics Media Photonics Buyers' Guide Photonics Spectra BioPhotonics EuroPhotonics Vision Spectra Photonics Showcase Photonics ProdSpec Photonics Handbook
More News

JMAR Picks SAL Inc. for x-Ray Lithography Stepper System

Facebook Twitter LinkedIn Email Comments
SAN DIEGO, Jan. 11 -- JMAR Technologies Inc. has awarded an initial phase contract to SAL Inc. of South Burlington, Vt., worth more than $1 million for an XRS 2000 NanoPulsar x-ray lithography system powered by a JMAR PXS-125 laser plasma x-ray source.
The complete NanoPulsar system will include an optical collimator developed by X-Ray Optical Systems Inc. of Albany, N.Y., under contract from JMAR Research Inc., JMAR's R&D division. The collimator directs the x-rays produced by the PXS-125 onto the semiconductor mask/wafer target. This is the first x-ray point source system with a collimator intended for semiconductor manufacturing. JMAR issued the contract under a Defense Advanced Research Project Agency (DARPA) funded program administered by the Army Research Laboratory to demonstrate laser plasma x-ray point source technology for advanced commercial lithography applications.

Photonics.com
Jan 2001
defenseindustrialNews & Features

Comments
back to top
Facebook Twitter Instagram LinkedIn YouTube RSS
©2019 Photonics Media, 100 West St., Pittsfield, MA, 01201 USA, info@photonics.com

Photonics Media, Laurin Publishing
x We deliver – right to your inbox. Subscribe FREE to our newsletters.
We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.