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JMAR Receives $5.3 Million Army Contract

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SAN DIEGO, June 24 -- JMAR Technologies Inc., provider of compact point-source, laser plasma lithography systems and sources, announed it has received a contract for $5,340,000 from the US Army Robert Morris Acquisition Center to complete the first of its integrated proprietary point-source laser plasma lithography systems.

The program is sponsored by the Defense Advanced Research Projects Agency (DARPA). The prototype system will initially perform sub-130 nm lithography demonstrations using gallium arsenide semiconductors, to begin this summer.

The fully integrated conventional-footprint Model 5J lithography system consists of a 1 nm wavelength laser plasma light source developed by the JMAR Research division in California, combined with an advanced nanostepper designed and built by the JMAR/SAL NanoLithography division in Vermont.


Photonics.com
Jun 2002
defenseindustrialNews & Features

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