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Laser Emissions Induced in Micron-Scale Silicon Aggregates

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Researchers from the University of Illinois in Urbana-Champaign have induced 610-nm laser emissions in aggregates of silicon as small as 8 µm in diameter. The aggregates were formed by dispersing nanoparticles of silicon from a bulk form through catalyzed electrochemical etching and allowing colloidal aggregates of the silicon to form in water. These were encapsulated in a polymer and then deposited onto a glass substrate.

The researchers, who reported their results in the Jan. 7 issue of Applied Physics Letters, used 550- to 570-nm mercury lamps to excite the nanoparticles, which manifest emissions in the form of Gaussian beams. The team also detected line narrowing and speckle patterns, indicating spatial coherence within the aggregates.
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Published: April 2002
Research & TechnologyTech PulseLasers

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