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Lithography System Selected

Photonics Spectra
Jun 2010
Yale University of New Haven, Conn. has selected Vistec Lithography Inc.’s EBPG5000plus electron-beam lithography system for its future nanotechnology research programs. As part of the Yale Institute for Nanoscience and Quantum Engineering, it will encourage multidisciplinary research involving the university’s faculty, students and worldwide research partners. The company, of Watervliet, N.Y., is a provider of electron-beam lithography equipment based on shaped beam technology.

1. A bundle of light rays that may be parallel, converging or diverging. 2. A concentrated, unidirectional stream of particles. 3. A concentrated, unidirectional flow of electromagnetic waves.
The use of atoms, molecules and molecular-scale structures to enhance existing technology and develop new materials and devices. The goal of this technology is to manipulate atomic and molecular particles to create devices that are thousands of times smaller and faster than those of the current microtechnologies.
AmericasbeamBusinessEBPG5000pluselectron beamelectron-beam lithography systemindustriallight speedlithographynanonanotechnologyVistec LithographyYale Institute for Nanoscience and Quantum EngineeringYale University

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