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Nikon and CEA/Léti to Develop Double Exposure and Patterning

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Nikon Corp. of Tokyo has entered into a joint development program with CEA/Léti, the electronics and information technology laboratory of the French Atomic Energy Commission, based in Grenoble. The microelectronics research center focuses on optical lithography development for technology beyond 45 nm. The companies will explore the potential of double exposure and double patterning for 32-nm semiconductor devices. A Nikon scanner will be employed in CEA/Léti’s Nanotec 300 research facility.

Photonics Spectra
Apr 2007
The technology of generating and harnessing light and other forms of radiant energy whose quantum unit is the photon. The science includes light emission, transmission, deflection, amplification and detection by optical components and instruments, lasers and other light sources, fiber optics, electro-optical instrumentation, related hardware and electronics, and sophisticated systems. The range of applications of photonics extends from energy generation to detection to communications and...
Basic ScienceBusinessEmploymentindustriallight speedNikon Corp.optical lithography developmentphotonicssemiconductor devices

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