Search
Menu
Rocky Mountain Instruments - Custom Assemblies LB

Oxford Applied Research Introduces RF Atom Sources With Beam Shaping

Facebook X LinkedIn Email
OXFORDSHIRE, Sept. 21 -- Oxford Applied Research (OAR) introduces a new range of RF Atom Sources for zero-damage oxide and nitride film growth over large areas. The new design encompasses beam shaping of the atomic flux to permit high uniformity to be achieved over up to 12" diameter substrate platens. OAR sources have been employed with great success in applications such as GaInNAs, GaN, ZnO, ultra-thin Al2O3 and deposition of high-k dielectric oxide layers. For more information visit www.oaresearch.co.uk.
DataRay Inc. - ISO 11146-Compliant

Published: September 2001
Basic ScienceNews & Features

We use cookies to improve user experience and analyze our website traffic as stated in our Privacy Policy. By using this website, you agree to the use of cookies unless you have disabled them.