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ASML Acquiring Cymer for $2.5B to Boost Chip Tech

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VELDHOVEN, Netherlands, and SAN DIEGO, Oct. 18, 2012 — Semiconductor lithography systems provider ASML Holding NV will acquire its light source supplier, Cymer Inc., for 1.95 billion euros (about $2.5 billion) in stock. ASML said the deal, announced Wednesday, will accelerate the development of extreme ultraviolet (EUV) semiconductor lithography technology. ASML and Cymer have collaborated closely for more than a year on the development of EUV technology, the companies say, and the acquisition evolved from that partnership. "Cymer will operate as an independent division and the DUV [deep-ultraviolet] and EUV light source center of...Read full article

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    Published: October 2012
    Glossary
    extreme ultraviolet
    Extreme ultraviolet (EUV) refers to a specific range of electromagnetic radiation in the ultraviolet part of the spectrum. EUV radiation has wavelengths between 10 and 124 nanometers, which corresponds to frequencies in the range of approximately 2.5 petahertz to 30 exahertz. This range is shorter in wavelength and higher in frequency compared to the far-ultraviolet and vacuum ultraviolet regions. Key points about EUV include: Source: EUV radiation is produced by extremely hot and energized...
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
    nano
    An SI prefix meaning one billionth (10-9). Nano can also be used to indicate the study of atoms, molecules and other structures and particles on the nanometer scale. Nano-optics (also referred to as nanophotonics), for example, is the study of how light and light-matter interactions behave on the nanometer scale. See nanophotonics.
    photolithography
    Photolithography is a key process in the manufacturing of semiconductor devices, integrated circuits, and microelectromechanical systems (MEMS). It is a photomechanical process used to transfer geometric patterns from a photomask or reticle to a photosensitive chemical photoresist on a substrate, typically a silicon wafer. The basic steps of photolithography include: Cleaning the substrate: The substrate, often a silicon wafer, is cleaned to remove any contaminants from its surface. ...
    acquisitionsAmericasASMLBob AkinsBusinessCaliforniaCymerdealdeep-ultravioletDUVEric MeuriceEuropeEUVextreme ultravioletGordon Mooreindustrialintegrated circuitsIntelLight SourceslithographymicrochipMoores LawnanoNetherlandsphotolithographysemiconductorsShareholdertransaction

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