Research and innovation hub imec and lithographic equipment developer ASML have entered the next stage of their extreme UV (EUV) lithography collaboration. Together, they will accelerate the adoption of EUV lithography for high-volume production, including the current latest available equipment, and establish a joint, high-numerical-aperture research lab. Moreover, they will explore the potential of the next-generation, high-numerical-aperture EUV lithography to enable printing of even smaller nanoscale devices advancing semiconductor scaling toward the post-3-nm logic node. imec...Read full articleRelated content from Photonics MediaARTICLESGas-Jet Lens Supports Refractive Optics in XUV DomainA new refractive lens developed by scientists at the Max Born Institute (MBI) uses a jet of atoms to focus extreme UV (XUV) beams. 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