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ASML to Provide EUV Lithography Systems to US Semiconductor Manufacturer

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ASML Holding NV will provide at least 15 extreme ultraviolet (EUV) lithography systems under a new agreement with a U.S. semiconductor manufacturer. Financial terms were not disclosed. Delivery of the first two NXE:3350B EUV systems is expected before the end of 2015. The customer, which already uses some EUV systems, intends to use the new machinery for multiple processing steps in future process technology nodes. EUV lithography simplifies the manufacturing process of the most advanced microchips, significantly improving yield and cycle time, according to ASML. "EUV is now...Read full article

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    Published: April 2015
    Glossary
    extreme ultraviolet
    Extreme ultraviolet (EUV) refers to a specific range of electromagnetic radiation in the ultraviolet part of the spectrum. EUV radiation has wavelengths between 10 and 124 nanometers, which corresponds to frequencies in the range of approximately 2.5 petahertz to 30 exahertz. This range is shorter in wavelength and higher in frequency compared to the far-ultraviolet and vacuum ultraviolet regions. Key points about EUV include: Source: EUV radiation is produced by extremely hot and energized...
    lithography
    Lithography is a key process used in microfabrication and semiconductor manufacturing to create intricate patterns on the surface of substrates, typically silicon wafers. It involves the transfer of a desired pattern onto a photosensitive material called a resist, which is coated onto the substrate. The resist is then selectively exposed to light or other radiation using a mask or reticle that contains the pattern of interest. The lithography process can be broadly categorized into several...
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