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Breakthrough Made in More Moore Project

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VELDHOVEN, the Netherlands, Dec. 13 -- One of the companies participating in a European project to improve the power output of an extreme ultraviolet lithography (EUVL) light source for semiconductor manufacturing has announced what it says is a significant breakthrough that could lead to the making of ever-smaller integrated circuits. More Moore is a research project funded by the European Commission to support the development of EUVL in Europe to enable chip makers to continue to meet Moore's law, which states that the computing power of semiconductors should double roughly every two years....Read full article

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